EUV Sources for Lithography (SPIE Press Monograph Vol. by Vivek Bakshi (Editor)

By Vivek Bakshi (Editor)

This entire quantity, edited via a senior technical employees member at SEMATECH, is the authoritative reference e-book on EUV resource know-how. the quantity comprises 38 chapters contributed via best researchers and providers within the EUV resource box. themes diversity from a cutting-edge assessment and in-depth rationalization of EUV resource standards, to basic atomic information and theoretical types of EUV assets according to discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), to an outline of popular DPP and LPP designs and different applied sciences for generating EUV radiation. extra themes contain EUV resource metrology and parts (collectors, electrodes), particles mitigation, and mechanisms of part erosion in EUV assets. the quantity is meant to fulfill the wishes of either practitioners of the expertise and readers looking an advent to the topic. Contents - Preface - creation - checklist of individuals - checklist of Abbreviations - creation and know-how evaluate - basics and Modeling - Plasma Pinch assets - Laser-Produced Plasma (LPP) resources - EUV resource Metrology - different different types of EUV resources - EUV resource parts - Index

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S. A. van der Westen, R. de Bruijn, F. Bijkerk, and V. Bakshi, “Flying Circus 2 milestone #2 report: Diagnostic performance,” ISMT Technology Transfer Report 03044396A-ENG (2003). org. 37. S. A. van der Westen, R. de Bruijn, F. , “Crosscalibration of extreme ultraviolet (EUV) energy sensors,” ISMT Technology Transfer Report 04024498A-TR (2004). org. 38. S. Grantham, “EUV source metrology for EUV source development,” ISMT Technology Transfer Report 04024494A-TR (2004). org. 39. L. A. Shmaenok, N.

Org. 37. S. A. van der Westen, R. de Bruijn, F. , “Crosscalibration of extreme ultraviolet (EUV) energy sensors,” ISMT Technology Transfer Report 04024498A-TR (2004). org. 38. S. Grantham, “EUV source metrology for EUV source development,” ISMT Technology Transfer Report 04024494A-TR (2004). org. 39. L. A. Shmaenok, N. N. Salashchenko, N. I. , “Multilayer based instrumentation developments for EUVL source metrology,” EUV Source Workshop, Santa Clara, CA (February 2003). org. 40. P. Marczuk, W. Egle, W.

Krücken, A. Weber, and J. Pankert, “Tin delivery systems for gas discharge sources,” EUV Source Workshop, San Jose, CA (February 2005). org. 45. Y. Watanabe, “Out of band radiation” (out-of-band panel discussion presentation), EUV Source Workshop, Miyazaki, Japan (November 2004). org. 46. H. Kondo, “Out of band radiation panel discussion summary” (out-of-band panel discussion presentation), EUV Source Workshop, Miyazaki, Japan (November 2004). org. 47. V. Bakshi, “Out of band radiation panel discussion summary” (out-of-band panel discussion presentation), EUV Source Workshop, Miyazaki, Japan (November 2004).

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